Shih-Cheng Hu 1, Chen-Wei Ku1, Yang-Cheng Shih1, Kwen Hsu2

  • 1 Department of Energy and Refrigerating Air-Conditioning Engineering, National Taipei University of Technology, Taipei, Taiwan
  • 2 TRW Company, Detroit Michigan, USA

Received: February 28, 2009
Revised: February 28, 2009
Accepted: February 28, 2009
Download Citation: ||https://doi.org/10.4209/aaqr.2008.11.0057  

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Cite this article:
Hu, S.C., Ku, C.W., Shih, Y.C. and Hsu, K. (2009). Dynamic Analysis on Particle Concentration Induced by Opening the Door of a Front Opening Unified Pod (FOUP) That Loaded with 25 Pieces of 300 mm Wafer Manufacturing Processes. Aerosol Air Qual. Res. 9: 139-148. https://doi.org/10.4209/aaqr.2008.11.0057


 

ABSTRACT


This study investigates experimentally and numerically the influences of FOUP door opening speed (Vdoor) and the pressure difference (dP) on the dynamic distributions of the averaged non-dimensional particle concentration in the FOUP (Cave), which is defined as averaged particle concentration in the FOUP (cave) divided by the particle concentration in the clean room (cCR). Here dP is the difference between the mini-environment pressure and the clean-room pressure. Results show that when Vdoor lies between 0.05 m/s~0.15 m/s and dP within 0.3 Pa-12.7 Pa, Cave proportional to 1/2ρVdoor2 and inversely proportional to dP. This can be expressed by a stepwise multiple regression equation: Cave = 4.56 × 10-1 (1/2ρVdoor2) – 4.6 × 10-4 dP + 4.96 × 10-3.


Keywords: Clean room; FOUP; Minienvironment; Semiconductor processes


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