Ya-Fen Wang 1, Cheng-Hsien Tsai2, Lien-Te Hsieh3, Min-Liang Shih1, Wen-Ching Chang1

  • 1 Department of Environmental Engineering and Science, Chia-Nan University of Pharmacy and Science, No. 60, Sec. 1, Erh-Jen Rd., Tainan 717, Taiwan
  • 2 Department of Chemical Engineering, National Kaohsiung University of Applied Sciences, No. 415, Chien Kung Road, 807 Kaohsiung, Taiwan
  • 3 Department of Environmental Engineering and Science National Pingtung University of Science and Technology, 1Hseuh Fu Rd., Nei Pu Hsiang, Ping Tung, 91201, Taiwan

Received: May 31, 2003
Revised: May 31, 2003
Accepted: May 31, 2003
Download Citation: ||https://doi.org/10.4209/aaqr.2003.06.0006 

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Cite this article:
Wang, Y.F., Tsai, C.H., Hsieh, L.T., Shih, M.L. and Chang, W.C. (2003). Decomposition of Boron Trifluoride in the RF Plasma Environment. Aerosol Air Qual. Res. 3: 53-59. https://doi.org/10.4209/aaqr.2003.06.0006


 

ABSTRACT


Boron trifluoride (BF3) is the most commonly used gas for implanting ions of the N-type dopant boron. BF3 is non-flammable and does not support combustion, but is toxic when inhaled and corrosive to the skin. A radio frequency (RF) plasma system used to decompose BF3 was examined. The BF3 decomposition fractions (ηBF3) were determined in effluent gas streams of BF3/CH4/Ar, BF3/O2/Ar and BF3/O2(glass)/Ar plasma systems. The by-products detected in the BF3/CH4/Ar plasma system were CO, CO2, SiF4, HF and boron-carbon compounds. The by-products detected in the BF3/O2/Ar plasma system were B2O3(s) and SiF4. The ηBF3 in the BF3/CH4/Ar plasma system was 49.8%, higher than that in the BF3/O2/Ar and BF3/O2(glass)/Ar plasma system. However, the amount of decomposed BF3 divided by the input energy (EBF3, energy efficiency) in the BF3/O2(glass)/Ar plasma system was greater than that in the BF3/CH4/Ar and BF3/O2/Ar plasma systems. Moreover, the photo images of depositions of different reacting gases O2, H2 with BF3 were also compared. The reaction in the BF3/O2/Ar plasma system generated B2O3 fine particles and led to the deposition of a white substance on the surface of the reactor. The ηBF3 was only around 25% for mixing with O2, even when the input power exceeded 120 Watts, but the generation of fine particles in the system warrants much more investigation.


Keywords: BF3; RF plasma; B2O3; Fine particle


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